(Buffalo.edu) University at Buffalo researchers have received a $1 million National Science Foundation (NSF) grant to help fund the purchase of a new 100-kilovolt electron beam lithography (EBL) system that will spur research and economic development in electronics, quantum computing.
Rajan Batta, interim dean of the School of Engineering and Applied Sciences, agreed the system will promote interdisciplinary research and lead to discoveries in electronics, photonics, quantum technology and other fields. He added: “Tools like this support the region’s economic development efforts, especially in advanced manufacturing and health care, and will help grow the number of tech-savvy workers in Western New York.”
In addition to UB, researchers and students from Rochester Institute of Technology, Alfred State College, SUNY Buffalo State, SUNY Erie Community College and Genesee Community College are expected to use the system.

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